NewsStock News

Applied Materials Breakthrough in Electron Beam Imaging Technology Accelerates Development of the World’s Most Advanced Computer Chips

Applied’s new “cold field emission” technology works at room temperature, increasing nanoscale image resolution by up to 50% and imaging speed by up to 10X CFE eBeam technology enables leading chipmakers to accelerate development and commercialization of emerging 3D Gate-All-Around logic

Source link

Related Articles

Leave a Reply

Your email address will not be published. Required fields are marked *

Back to top button

Welcome to The Finance Headline

Adblocker Detected! Please turn off your adblocker extension app to continue reading the articles/finance news. With your support, The Finance Headline is able to provide free resources.